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dc.contributor.authorTsai, Shiang-Yuen_US
dc.contributor.authorLin, Chun-Yuen_US
dc.contributor.authorChu, Li-Weien_US
dc.contributor.authorKer, Ming-Douen_US
dc.date.accessioned2014-12-08T15:30:03Z-
dc.date.available2014-12-08T15:30:03Z-
dc.date.issued2012en_US
dc.identifier.isbn978-1-4577-1728-4en_US
dc.identifier.urihttp://hdl.handle.net/11536/21528-
dc.description.abstractDue to the potential for mass production, CMOS technologies have been widely used to implement radio-frequency integrated circuits (RF ICs). Electrostatic discharge (ESD), which is one of the most important reliability issues in CMOS technologies, must be considered in RF ICs. In this work, an on-chip ESD protection design for RF power amplifier (PA) was presented. The ESD protection design consisted of an inductor in the matching network of PA. The PA with this ESD protection had been designed and fabricated in a 65-nm CMOS process. The ESD-protected PA can sustain over 4-kV human-body-mode (HBM) ESD stress, while the unprotected PA was degrated after 1-kv HBM ESD stress.en_US
dc.language.isoen_USen_US
dc.titleDesign of ESD Protection for RF CMOS Power Amplifier with Inductor in Matching Networken_US
dc.typeProceedings Paperen_US
dc.identifier.journal2012 IEEE ASIA PACIFIC CONFERENCE ON CIRCUITS AND SYSTEMS (APCCAS)en_US
dc.citation.spage467en_US
dc.citation.epage470en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000316598900118-
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