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dc.contributor.authorLee, Ya-Juen_US
dc.contributor.authorLee, Chia-Jungen_US
dc.contributor.authorChen, Chih-Haoen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.date.accessioned2014-12-08T15:30:33Z-
dc.date.available2014-12-08T15:30:33Z-
dc.date.issued2011-07-01en_US
dc.identifier.issn1077-260Xen_US
dc.identifier.urihttp://dx.doi.org/10.1109/JSTQE.2010.2064287en_US
dc.identifier.urihttp://hdl.handle.net/11536/21832-
dc.description.abstractThe current-voltage (I-V) characteristics of the InGaN nanorod light-emitting diode (LED) are evaluated using nanoprobes installed on a field-emission scanning electron microscope. The saturated current of the InGaN nanorod LED (I(O) = 2 x 10(-9) A) is found to be orders of magnitude higher than those obtained by downscaling a conventional InGaN LED to a chip size of 300 x 300 mu m(2) (I(O1) = 1 x 10(-25) A; I(O2) = 1 x 10(-14) A). This observation is explained by the fact that the nanorod LED is associated with enhanced tunneling of injected carriers and, therefore, reduction of the defect-assisted leakage current and the diffusion-recombination process that normally occurs in InGaN LEDs.en_US
dc.language.isoen_USen_US
dc.subjectLight-emitting diode (LED)en_US
dc.subjectnanoroden_US
dc.subjecttunneling effecten_US
dc.titleElucidating the Physical Property of the InGaN Nanorod Light-Emitting Diode: Large Tunneling Effecten_US
dc.typeArticleen_US
dc.identifier.doi10.1109/JSTQE.2010.2064287en_US
dc.identifier.journalIEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICSen_US
dc.citation.volume17en_US
dc.citation.issue4en_US
dc.citation.spage985en_US
dc.citation.epage989en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000293755500026-
dc.citation.woscount4-
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