標題: | Using SiOx nano-films to enhance GZO Thin films properties as front electrodes of a-Si solar cells |
作者: | Chang, Kow-Ming Ho, Po-Ching Yu, Shu-Hung Hsu, Jui-Mei Yang, Kuo-Hui Wu, Chin-Jyi Chang, Chia-Chiang 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Atmospheric pressure plasma;Light-trapping effect;Transparent conductive oxide |
公開日期: | 1-Jul-2013 |
摘要: | One of the essential applications of transparent conductive oxides is as front electrodes for superstrate silicon thin-film solar cells. Textured TCO thin films can improve absorption of sunlight for an a-Si:H absorber during a single optical path. In this study, high-haze and low-resistivity bilayer GZO/SiOx thin films prepared using an atmospheric pressure plasma jet (APPJ) deposition technique and dc magnetron sputtering. The silicon subdioxide nano-film plays an important role in controlling the haze value of subsequent deposited GZO thin films. The bilayer GZO/SiOx (90 sccm) sample has the highest haze value (22.30%), the lowest resistivity (8.98 x 10(-4) Omega cm), and reaches a maximum cell efficiency of 6.85% (enhanced by approximately 19% compared to a sample of non-textured GZO). (c) 2013 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.apsusc.2013.03.165 http://hdl.handle.net/11536/21838 |
ISSN: | 0169-4332 |
DOI: | 10.1016/j.apsusc.2013.03.165 |
期刊: | APPLIED SURFACE SCIENCE |
Volume: | 276 |
Issue: | |
起始頁: | 756 |
結束頁: | 760 |
Appears in Collections: | Articles |
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