標題: | Enhancement of Open-Circuit Voltage Using CF4 Plasma Treatment on Nitric Acid Oxides |
作者: | Lin, Je-Wei Wu, Chien-Hung Wu, Sheng-Wei Hseih, Wei-Ping Du, Chen-Hsu Chao, Tien-Sheng 電子物理學系 Department of Electrophysics |
關鍵字: | CF4 plasma;low-temperature oxides;open-circuit voltage;surface passivation |
公開日期: | 1-五月-2013 |
摘要: | Surface passivation of solar cells is investigated using CF4 plasma treatment on low-temperature oxides to enhance the open-circuit voltage of the solar cells. Low-temperature oxides grown by a nitric acid solution are treated with the CF4 plasma. Solar cells undergoing this scheme show an improved performance, including low-saturation current density and good quantum efficiency at short wavelengths. Experimental results demonstrate that the CF4 plasma pretreatment on low-temperature oxides can significantly improve the open-circuit voltage, short-circuit current, and fill factor for silicon wafer-based solar cells. This technique is very promising for in-line solar cell manufacturing. |
URI: | http://dx.doi.org/10.1109/LED.2013.2253757 http://hdl.handle.net/11536/21907 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2013.2253757 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 34 |
Issue: | 5 |
起始頁: | 665 |
結束頁: | 667 |
顯示於類別: | 期刊論文 |