完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Huang, Yu-Ching | en_US |
dc.contributor.author | Dai, Chia-Tsen | en_US |
dc.contributor.author | Ker, Ming-Dou | en_US |
dc.date.accessioned | 2014-12-08T15:30:45Z | - |
dc.date.available | 2014-12-08T15:30:45Z | - |
dc.date.issued | 2013 | en_US |
dc.identifier.isbn | 978-1-4673-3037-4 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/21975 | - |
dc.description.abstract | For high-voltage output driver, the lateral DMOS (LDMOS) is often used for both output function operation and self-protection against electrostatic discharge (ESD) events. In this work, a new structure of LDMOS output device with embedded SCR has been proposed and verified in a 0.25-mu m 60-V BCD process. This new structure, with additional p(+) and n(+) implantation regions added between the drain contact and poly-gate of LDMOS, can keep it stably in the high-current holding region after snapback. By using this structure, the LDMOS can provide high enough self-protected ESD robustness for applications in the high-voltage output drivers. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Electrostatic discharges (ESD) | en_US |
dc.subject | lateral diffused MOS (LDMOS) | en_US |
dc.subject | silicon-controlled rectifier (SCR) | en_US |
dc.title | Self-Protected LDMOS Output Device with Embedded SCR to Improve ESD Robustness in 0.25-mu m 60-V BCD Process | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | IEEE INTERNATIONAL SYMPOSIUM ON NEXT-GENERATION ELECTRONICS 2013 (ISNE 2013) | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000319457000036 | - |
顯示於類別: | 會議論文 |