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dc.contributor.authorWu, Chi-Changen_US
dc.contributor.authorYou, Hsin-Chiangen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.contributor.authorYang, Wen-Luhen_US
dc.date.accessioned2014-12-08T15:31:13Z-
dc.date.available2014-12-08T15:31:13Z-
dc.date.issued2010en_US
dc.identifier.isbn978-1-4244-3543-2en_US
dc.identifier.urihttp://hdl.handle.net/11536/22230-
dc.description.abstractA nanocrystal (NC) memory by sol-gel spin-coating method was demonstrated. The high-density and isolated NC was formed by depositing a mixed solution of nickel tetrachloride, zirconium tetrachloride, silicon tetrachloride, and germanium tetrachloride with a post-rapid thermal annealing process. The electrical properties in terms of memory window, charge retention, program/erase speed, and endurance were demonstrated. The memory window of the NC memory can be up to 2.8 V: the retention times were extrapolated up to 10(6) sec for about 5% and 10% charge loss at 25 and 85 degrees C measurement, respectively. The voltage shift after 10(4) program/erase cycles is less than 1V. The good electrical performance was attributed to the effects of the high-density isolated NCs.en_US
dc.language.isoen_USen_US
dc.titleNovel Sol-gel Derived SONOS-type Nanocrystal Memoryen_US
dc.typeArticleen_US
dc.identifier.journalINEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2en_US
dc.citation.spage1228en_US
dc.citation.epage1229en_US
dc.contributor.department材料科學與工程學系奈米科技碩博班zh_TW
dc.contributor.departmentGraduate Program of Nanotechnology , Department of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000282026500625-
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