标题: | Structural and nanomechanical properties of BiFeO3 thin films deposited by radio frequency magnetron sputtering |
作者: | Jian, Sheng-Rui Chang, Huang-Wei Tseng, Yu-Chin Chen, Ping-Han Juang, Jenh-Yih 电子物理学系 Department of Electrophysics |
关键字: | BiFeO3 thin films;XRD;AFM;Nanoindentation;Hardness |
公开日期: | 25-六月-2013 |
摘要: | The nanomechanical properties of BiFeO3 (BFO) thin films are subjected to nanoindentation evaluation. BFO thin films are grown on the Pt/Ti/SiO2/Si substrates by using radio frequency magnetron sputtering with various deposition temperatures. The structure was analyzed by X-ray diffraction, and the results confirmed the presence of BFO phases. Atomic force microscopy revealed that the average film surface roughness increased with increasing of the deposition temperature. A Berkovich nanoindenter operated with the continuous contact stiffness measurement option indicated that the hardness decreases from 10.6 to 6.8 GPa for films deposited at 350A degrees C and 450A degrees C, respectively. In contrast, Young's modulus for the former is 170.8 GPa as compared to a value of 131.4 GPa for the latter. The relationship between the hardness and film grain size appears to follow closely with the Hall-Petch equation. |
URI: | http://dx.doi.org/10.1186/1556-276X-8-297 http://hdl.handle.net/11536/22279 |
ISSN: | 1931-7573 |
DOI: | 10.1186/1556-276X-8-297 |
期刊: | NANOSCALE RESEARCH LETTERS |
Volume: | 8 |
Issue: | |
结束页: | |
显示于类别: | Articles |
文件中的档案:
If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.