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dc.contributor.authorHsieh, Cheng-Yuen_US
dc.contributor.authorLin, Bo-Wenen_US
dc.contributor.authorCheng, Wen-Haoen_US
dc.contributor.authorWang, Bau-Mingen_US
dc.contributor.authorChang, Lien_US
dc.contributor.authorWu, YewChung Sermonen_US
dc.date.accessioned2014-12-08T15:31:37Z-
dc.date.available2014-12-08T15:31:37Z-
dc.date.issued2012en_US
dc.identifier.issn2162-8769en_US
dc.identifier.urihttp://hdl.handle.net/11536/22409-
dc.identifier.urihttp://dx.doi.org/10.1149/2.006201jssen_US
dc.description.abstractA (10 (1) over bar4) semipolar GaN layer was grown on periodic stripe patterned a-plane sapphire substrate fabricated by using two-steps etching process. The stripes in prism shape were inclined with sapphire c-axis in 60 degrees. The orientation relationship between semipolar GaN and sapphire is (0002)(GaN)//(2 (1) over bar(1) over bar(3) over bar)(sapphire) and [2 (1) over bar(1) over bar0](GaN)//[23 (5) over bar2](sapphire) as defined by selected area diffraction in transmission electron microscopy (TEM). Growth of semipolar GaN on the sidewalls of the prism stripes is evidenced from TEM and X-ray phi scan. The quality of semipolar GaN film is reasonably good as examined with X-ray rocking curves. In addition, TEM and cathodoluminescence results show that the dislocation density in the semipolar GaN is significantly reduced near the film surface. (C) 2012 The Electrochemical Society. All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleSemipolar GaN Films on Prism Stripe Patterned a-Plane Sapphire Substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/2.006201jssen_US
dc.identifier.journalECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGYen_US
dc.citation.volume1en_US
dc.citation.issue1en_US
dc.citation.spageR54en_US
dc.citation.epageR56en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000319443900031-
dc.citation.woscount0-
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