完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chang, Kuan-Chang | en_US |
dc.contributor.author | Tsai, Tsung-Ming | en_US |
dc.contributor.author | Zhang, Rui | en_US |
dc.contributor.author | Chang, Ting-Chang | en_US |
dc.contributor.author | Chen, Kai-Huang | en_US |
dc.contributor.author | Chen, Jung-Hui | en_US |
dc.contributor.author | Young, Tai-Fa | en_US |
dc.contributor.author | Lou, J. C. | en_US |
dc.contributor.author | Chu, Tian-Jian | en_US |
dc.contributor.author | Shih, Chih-Cheng | en_US |
dc.contributor.author | Pan, Jhih-Hong | en_US |
dc.contributor.author | Su, Yu-Ting | en_US |
dc.contributor.author | Syu, Yong-En | en_US |
dc.contributor.author | Tung, Cheng-Wei | en_US |
dc.contributor.author | Chen, Min-Chen | en_US |
dc.contributor.author | Wu, Jia-Jie | en_US |
dc.contributor.author | Hu, Ying | en_US |
dc.contributor.author | Sze, Simon M. | en_US |
dc.date.accessioned | 2014-12-08T15:31:55Z | - |
dc.date.available | 2014-12-08T15:31:55Z | - |
dc.date.issued | 2013-08-19 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.4819162 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/22547 | - |
dc.description.abstract | In this study, the electrical conduction mechanism of Zn:SiOx resistance random access memory (RRAM) treated with supercritical CO2 fluid (SCCO2) process was investigated by low temperature measurement. The current of low resistance state for current-voltage curves in SCCO2-treated and untreated Zn:SiOx RRAM were measured and compared under a low temperature range from 100K to 298 K. The electrical conduction mechanisms of hopping conduction and metal-like behaviors in SCCO2-treated and untreated Zn:SiOx RRAM were discussed, respectively. Finally, the electrical conduction mechanism was analyzed and verified by the chemical composition and bonding intensity of XPS analyses. (C) 2013 AIP Publishing LLC. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Electrical conduction mechanism of Zn:SiOx resistance random access memory with supercritical CO2 fluid process | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.4819162 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 103 | en_US |
dc.citation.issue | 8 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000323788100091 | - |
dc.citation.woscount | 18 | - |
顯示於類別: | 期刊論文 |