標題: | Low Temperature Improvement Method on Zn:SiOx Resistive Random Access Memory Devices |
作者: | Chang, Kuan-Chang Tsai, Tsung-Ming Chang, Ting-Chang Wu, Hsing-Hua Chen, Kai-Huang Chen, Jung-Hui Young, Tai-Fa Chu, Tian-Jian Chen, Jian-Yu Pan, Chih-Hung Su, Yu-Ting Syu, Yong-En Tung, Cheng-Wei Chang, Geng-Wei Chen, Min-Chen Huang, Hui-Chun Tai, Ya-Hsiang Gan, Der-Shin Wu, Jia-Jie Hu, Ying Sze, Simon M. 電子工程學系及電子研究所 光電工程學系 Department of Electronics Engineering and Institute of Electronics Department of Photonics |
關鍵字: | Nonvolatile memory;resistive switching;silicon oxide;zinc |
公開日期: | 1-四月-2013 |
摘要: | To improve the resistive switching properties of the resistive random access memory (RRAM), the supercritical carbon dioxide (SCCO2) fluid is used as a low temperature treatment. In this letter, the Zn:SiOx thin films are treated by SCCO2 fluid mixed with pure water. After SCCO2 fluid treatment, the resistive switching qualities of the Zn:SiOx thin films are carried out by XPS, fourier transform infrared spectroscopy, and IV measurement. We believe that the SCCO2-treated Zn:SiOx thin film is a promising material for RRAM applications due to its compatibility with portable flat panel display. |
URI: | http://dx.doi.org/10.1109/LED.2013.2248075 http://hdl.handle.net/11536/21715 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2013.2248075 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 34 |
Issue: | 4 |
起始頁: | 511 |
結束頁: | 513 |
顯示於類別: | 期刊論文 |