GROWTH PARAMETER EFFECT IN SUPERCONDUCTING YBA2CU4O8 THIN-FILMS BY DC MAGNETRON SPUTTERING

doi:10.1007/BF00349952

Full metadata record

DC Field	Value	Language
dc.contributor.author	WU, SC	en_US
dc.contributor.author	HSU, HT	en_US
dc.contributor.author	CHEN, FH	en_US
dc.contributor.author	CHANG, WR	en_US
dc.contributor.author	TSENG, TY	en_US
dc.date.accessioned	2014-12-08T15:03:43Z	-
dc.date.available	2014-12-08T15:03:43Z	-
dc.date.issued	1994-11-01	en_US
dc.identifier.issn	0022-2461	en_US
dc.identifier.uri	http://dx.doi.org/10.1007/BF00349952	en_US
dc.identifier.uri	http://hdl.handle.net/11536/2256	-
dc.description.abstract	High-T-c YBa2Cu4O8 (124) thin films have been made by d.c. magnetron sputtering deposition on (100) MgO substrates. The effect of several processing variables, including the ratio of oxygen to argon, total pressure, and substrate temperature, on the superconducting properties of the thin films, were systematically investigated. The as-prepared films annealed in flowing oxygen at 800 degrees C for 4 h under ambient pressure obtained nearly phase-pure 124 and exhibited superconducting onset transition at 75 K.	en_US
dc.language.iso	en_US	en_US
dc.title	GROWTH PARAMETER EFFECT IN SUPERCONDUCTING YBA2CU4O8 THIN-FILMS BY DC MAGNETRON SPUTTERING	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1007/BF00349952	en_US
dc.identifier.journal	JOURNAL OF MATERIALS SCIENCE	en_US
dc.citation.volume	29	en_US
dc.citation.issue	21	en_US
dc.citation.spage	5593	en_US
dc.citation.epage	5598	en_US
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.identifier.wosnumber	WOS:A1994PR24900012	-
dc.citation.woscount	3	-
Appears in Collections:	Articles