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dc.contributor.authorYu, Jue-Chinen_US
dc.contributor.authorYu, Peichenen_US
dc.contributor.authorChao, Hsueh-Yungen_US
dc.date.accessioned2014-12-08T15:32:05Z-
dc.date.available2014-12-08T15:32:05Z-
dc.date.issued2013-07-01en_US
dc.identifier.issn1057-7149en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TIP.2013.2253482en_US
dc.identifier.urihttp://hdl.handle.net/11536/22611-
dc.description.abstractIn optical microlithography, the illumination source for critical complementary metal oxide semiconductor layers needs to be determined in the early stage of a technology node with very limited design information, leading to simple binary shapes. Recently, the availability of freeform sources permits us to increase pattern fidelity and relax mask complexities with minimal insertion risks to the current manufacturing flow. However, source optimization across many patterns is often treated as a design-of-experiments problem, which may not fully exploit the benefits of a freeform source. In this paper, a rigorous source-optimization algorithm is presented via linear superposition of optimal sources for pre-selected patterns. We show that analytical solutions are made possible by using Hopkins formulation and quadratic programming. The algorithm allows synthesized illumination to be linked with assorted pattern libraries, which has a direct impact on design rule studies for early planning and design automation for full wafer optimization.en_US
dc.language.isoen_USen_US
dc.subjectInverse lithographyen_US
dc.subjectobjective functionen_US
dc.subjectoptical lithographyen_US
dc.subjectsegment-based optical proximity correction (OPC)en_US
dc.subjectsource mask optimization (SMO)en_US
dc.subjectsource synthesisen_US
dc.titleLibrary-Based Illumination Synthesis for Critical CMOS Patterningen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TIP.2013.2253482en_US
dc.identifier.journalIEEE TRANSACTIONS ON IMAGE PROCESSINGen_US
dc.citation.volume22en_US
dc.citation.issue7en_US
dc.citation.spage2811en_US
dc.citation.epage2821en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000321924600024-
dc.citation.woscount3-
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