完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Wang, Yu-Sheng | en_US |
dc.contributor.author | Lee, Wen-Hsi | en_US |
dc.contributor.author | Chang, Shih-Chieh | en_US |
dc.contributor.author | Nian, Jun-Nan | en_US |
dc.contributor.author | Wang, Ying-Lang | en_US |
dc.date.accessioned | 2014-12-08T15:32:22Z | - |
dc.date.available | 2014-12-08T15:32:22Z | - |
dc.date.issued | 2013-10-01 | en_US |
dc.identifier.issn | 0040-6090 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.tsf.2013.03.131 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/22730 | - |
dc.description.abstract | A twin boundary is a special kind of grain boundary that plays an important role in the deformation process of nanocrystalline metals, as it may affect the migration of atoms and electrons in polycrystalline solids, resulting in different electrical and mechanical properties. In this study, plane twin structures were introduced into an electroplated copper film by an electroplating method that inserts an interlayer film with a very small current density (<3 mA/cm(2)). It was found that the small-current interlayer formed a demarcation line for copper grain growth, and enhanced the twin boundaries by self-annealing at room temperature. Based on this, a method was developed to manufacture multi-plane twin boundaries to improve electron migration. Transmission electron microscopy, focused ion beam analysis, and secondary ion mass spectrometry were employed to examine this interesting phenomenon. (C) 2013 Elsevier B. V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Twin boundary | en_US |
dc.subject | Electroplating | en_US |
dc.subject | Copper | en_US |
dc.title | An electroplating method for copper plane twin boundary manufacturing | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.tsf.2013.03.131 | en_US |
dc.identifier.journal | THIN SOLID FILMS | en_US |
dc.citation.volume | 544 | en_US |
dc.citation.issue | en_US | |
dc.citation.spage | 157 | en_US |
dc.citation.epage | 161 | en_US |
dc.contributor.department | 照明與能源光電研究所 | zh_TW |
dc.contributor.department | Institute of Lighting and Energy Photonics | en_US |
dc.identifier.wosnumber | WOS:000324309100033 | - |
dc.citation.woscount | 1 | - |
顯示於類別: | 期刊論文 |