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dc.contributor.authorLin, C. K.en_US
dc.contributor.authorTsao, Wei Anen_US
dc.contributor.authorLiang, Y. C.en_US
dc.contributor.authorChen, Chihen_US
dc.date.accessioned2014-12-08T15:32:24Z-
dc.date.available2014-12-08T15:32:24Z-
dc.date.issued2013-09-21en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4821427en_US
dc.identifier.urihttp://hdl.handle.net/11536/22749-
dc.description.abstractTemperature-dependent electromigration failure was investigated in solder joints with Cu metallization at 126 degrees C, 136 degrees C, 158 degrees C, 172 degrees C, and 185 degrees C. At 126 degrees C and 136 degrees C, voids formed at the interface of Cu6Sn5 intermetallic compounds and the solder layer. However, at temperature 158 degrees C and above, extensive Cu dissolution and thickening of Cu6Sn5 occurred, and few voids were observed. We proposed a model considering the flux divergency at the interface. At temperatures below 131 degrees C, the electromigration flux leaving the interface is larger than the in-coming flux. Yet, the in-coming Cu electromigration flux surpasses the out-going flux at temperatures above 131 degrees C. This model successfully explains the experimental results. (C) 2013 AIP Publishing LLC.en_US
dc.language.isoen_USen_US
dc.titleTemperature-dependent failure mechanism of SnAg solder joints with Cu metallization after current stressing: Experimentation and analysisen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.4821427en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume114en_US
dc.citation.issue11en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000324827200036-
dc.citation.woscount0-
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