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dc.contributor.authorLiu, Hao Hengen_US
dc.contributor.authorLin, Tzung Hanen_US
dc.contributor.authorSheu, Jeng-Tzongen_US
dc.date.accessioned2014-12-08T15:33:02Z-
dc.date.available2014-12-08T15:33:02Z-
dc.date.issued2013-10-01en_US
dc.identifier.issn1944-8244en_US
dc.identifier.urihttp://dx.doi.org/10.1021/am402586qen_US
dc.identifier.urihttp://hdl.handle.net/11536/22999-
dc.description.abstractIn this study, a self-assembled monolayer (SAM) of methoxy-poly (ethylene-glycol)-silane (mPEG-sil) was used to modify the silicon dioxide surface of polysilicon nanodevices (PNDs) to act as a passivation layer that inhibits nonspecific binding of proteins and reduces localized Joule heating power. Selective modifications of 3-aminopropyltrimethoxysilane (APTMS), NHS-biotin and dye-labeled Streptavidin on the removal regions were characterized. These PNDs, which consist of a two-level doping profile, were designed to confine heat in the low-level doping region during localized Joule heating. Localized Joule heating with pulse bias was examined in both vacuum and ambient, which indicated the removal region was longer in vacuum for the same pulse bias. Moreover, a comparison of selectively and nonselectively modified PNDs observed in time-lapsed fluorescence detection of dye-labeled Streptavidin showed a higher increasing rate in fluorescence intensity (similar to 2x enhancement) in the selectively modified PNDs. Finally, a COMSOL simulation was employed to evaluate the temperature distribution in the PNDs, with results showing that heat confinement was observed in the low-level doping region and a temperature very close to 673 K was achieved while applying a pulse voltage (40 V, 5 mu s) to remove mPEG-sil.en_US
dc.language.isoen_USen_US
dc.subjectpolysilicon nanobeltsen_US
dc.subjectlocalized Joule heatingen_US
dc.subjectself-assembled monolayeren_US
dc.subjectselective modificationen_US
dc.titleSelf-Assembled Monolayer-Based Selective Modification on Polysilicon Nanobelt Devicesen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/am402586qen_US
dc.identifier.journalACS APPLIED MATERIALS & INTERFACESen_US
dc.citation.volume5en_US
dc.citation.issue20en_US
dc.citation.spage10048en_US
dc.citation.epage10053en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000326212900027-
dc.citation.woscount2-
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