Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces

標題:	Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces
作者:	Huijben, M. Yu, P. Martin, L. W. Molegraaf, H. J. A. Chu, Y. -H. Holcomb, M. B. Balke, N. Rijnders, G. Ramesh, R. 材料科學與工程學系 Department of Materials Science and Engineering
關鍵字:	exchange bias;interface;oxide heterostructure;multiferroic;ferromagnet
公開日期:	14-Sep-2013
URI:	http://dx.doi.org/10.1002/adma.201300940 http://hdl.handle.net/11536/23319
ISSN:	0935-9648
DOI:	10.1002/adma.201300940
期刊:	ADVANCED MATERIALS
Volume:	25
Issue:	34
起始頁:	4739
結束頁:	4745
Appears in Collections:	Articles

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