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dc.contributor.authorCheng, Yi-Lungen_US
dc.contributor.authorLeon, Ka-Waien_US
dc.contributor.authorHuang, Jun-Fuen_US
dc.contributor.authorChang, Wei-Yuanen_US
dc.contributor.authorChang, Yu-Minen_US
dc.contributor.authorLeu, Jihperngen_US
dc.date.accessioned2014-12-08T15:33:54Z-
dc.date.available2014-12-08T15:33:54Z-
dc.date.issued2014-02-01en_US
dc.identifier.issn0167-9317en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.mee.2013.08.018en_US
dc.identifier.urihttp://hdl.handle.net/11536/23370-
dc.description.abstractThe effect of absorbed moisture on the electrical characteristics and reliability of low dielectric constant materials (low-k) was investigated in this study. The experimental results reveal that porous low-k dielectrics absorb more moisture than dense low-k dielectrics. This absorbed moisture degrades the electrical performance and reliability of both classes of low-k dielectrics. Annealing at a higher temperature of 400 degrees C is required to decompose the physically-adsorbed moisture and thereby restore reliability performance. However, the chemically-adsorbed moisture seems to be difficult to remove by annealing at 400 degrees C, causing a degraded TDDB performance. Crown Copyright (C) 2013 Published by Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectLow-k dielectricen_US
dc.subjectPorogenen_US
dc.subjectMoistureen_US
dc.subjectReliabilityen_US
dc.subjectBreakdownen_US
dc.subjectTDDBen_US
dc.subjectElectromigrationen_US
dc.titleEffect of moisture on electrical properties and reliability of low dielectric constant materialsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.mee.2013.08.018en_US
dc.identifier.journalMICROELECTRONIC ENGINEERINGen_US
dc.citation.volume114en_US
dc.citation.issueen_US
dc.citation.spage12en_US
dc.citation.epage16en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000329417600003-
dc.citation.woscount5-
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