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dc.contributor.authorJian, Sheng-Ruien_US
dc.contributor.authorTseng, Yu-Chinen_US
dc.contributor.authorTeng, I-Juen_US
dc.contributor.authorJuang, Jenh-Yihen_US
dc.date.accessioned2014-12-08T15:34:24Z-
dc.date.available2014-12-08T15:34:24Z-
dc.date.issued2013-09-01en_US
dc.identifier.issn1996-1944en_US
dc.identifier.urihttp://dx.doi.org/10.3390/ma6094259en_US
dc.identifier.urihttp://hdl.handle.net/11536/23554-
dc.description.abstractNanoindentation-induced multiple pop-ins were observed in the load-displacement curves when the mechanical responses of AlN films grown on c-plane sapphire substrates were investigated by using Berkovich indenters. No evidence of phase transformation is revealed by cross-sectional transmission electron microscopy (XTEM) and selected area diffraction (SAD) analyses. Instead XTEM observations suggest that these "instabilities" resulted from the sudden nucleation of dislocations propagating along the slip systems lying on the {0001} basal planes and the {10 (1) over bar1} pyramidal planes commonly observed in hexagonal compound semiconductors. Based on this scenario, an energetic estimation of dislocation nucleation is made.en_US
dc.language.isoen_USen_US
dc.subjectnanoindentationen_US
dc.subjectpop-insen_US
dc.subjectAlN thin filmsen_US
dc.subjecttransmission electron microscopyen_US
dc.titleDislocation Energetics and Pop-Ins in AlN Thin Films by Berkovich Nanoindentationen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/ma6094259en_US
dc.identifier.journalMATERIALSen_US
dc.citation.volume6en_US
dc.citation.issue9en_US
dc.citation.spage4259en_US
dc.citation.epage4267en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000330294700032-
dc.citation.woscount8-
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