Title: Monitoring defects in IC fabrication using a hotelling T-2 control chart
Authors: Tong, LI
Wang, CH
Huang, CL
工業工程與管理學系
Department of Industrial Engineering and Management
Keywords: C chart;defect;defect clustering;integrated circuits (IC);hotelling T-2 control chart;wafer
Issue Date: 1-Feb-2005
Abstract: Monitoring the wafer defects in integrated circuit (IC) fabrication is essential for enhancing wafer yield. However, significant defect clustering occurs when the wafer is large, so the conventional defect control chart, based on the Poisson distribution, is inappropriate. Defect clustering must also be analyzed to monitor effectively defects in ICI fabrication process control. This study developed a novel procedure using the multivariate Hotelling T-2 control chart, based on the number of defects and the defect clustering index (CI) to monitor simultaneously the number of defects and the defect clusters. The CI does,not require any statistical assumptions concerning the distribution of defects and can accurately evaluate the clustering phenomena. A case study of a Taiwanese IC manufacturer demonstrates the effectiveness of the proposed procedure.
URI: http://dx.doi.org/10.1109/TSM.2004.836659
http://hdl.handle.net/11536/23788
ISSN: 0894-6507
DOI: 10.1109/TSM.2004.836659
Journal: IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
Volume: 18
Issue: 1
Begin Page: 140
End Page: 147
Appears in Collections:Articles


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