標題: | Dependence of the Noise Behavior on the Drain Current for Thin Film Transistors |
作者: | Tai, Ya-Hsiang Chang, Chun-Yi Hsieh, Chung-Lun Yang, Yung-Hsuan Chao, Wei-Kuang Chen, Huan-Ean 光電工程學系 顯示科技研究所 Department of Photonics Institute of Display |
關鍵字: | Thin-film transistor (TFTs);low frequency noise (LFN);amorphous indium-gallium-zinc oxide (a-IGZO);active pixel sensor (APS) |
公開日期: | 1-Feb-2014 |
摘要: | In this letter, a noise formula is newly proposed to calculate the low frequency noise for the three kinds of amorphous silicon, low temperature polycrystalline silicon, and amorphous indium-gallium-zinc oxide (a-IGZO) thin film transistors (TFTs). It is found that the noise behavior of the TFT depends on its drain current in a simple manner. Based on the analysis, the ratios of drain current to the noise level for these TFTs are compared. It reveals that a-IGZO TFT is the best candidate to be used in the active pixel sensor. |
URI: | http://dx.doi.org/10.1109/LED.2013.2291565 http://hdl.handle.net/11536/23809 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2013.2291565 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 35 |
Issue: | 2 |
起始頁: | 229 |
結束頁: | 231 |
Appears in Collections: | Articles |
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