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dc.contributor.authorLin, Meng-Yuen_US
dc.contributor.authorChen, Yen-Haoen_US
dc.contributor.authorSu, Chen-Fungen_US
dc.contributor.authorChang, Shu-Weien_US
dc.contributor.authorLee, Si-Chenen_US
dc.contributor.authorLin, Shih-Yenen_US
dc.date.accessioned2014-12-08T15:35:07Z-
dc.date.available2014-12-08T15:35:07Z-
dc.date.issued2014-01-13en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4862275en_US
dc.identifier.urihttp://hdl.handle.net/11536/23838-
dc.description.abstractWe investigate the electronic properties of p-type graphene transistors on silicon dioxide with dual-cut channels that were scraped using atomic force microscope tips. In these devices, the current is forced to squeeze into the path between the two cuts rather than flow directly through the graphene sheet. We observe that the gate voltages with minimum current shift toward zero bias as the sizes of the dual-cut regions increase. These phenomena suggest that the Fermi levels in the dual-cut regions are shifted toward the Dirac points after the mechanical scraping process. (C) 2014 AIP Publishing LLC.en_US
dc.language.isoen_USen_US
dc.titleFermi-level shifts in graphene transistors with dual-cut channels scraped by atomic force microscope tipsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.4862275en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume104en_US
dc.citation.issue2en_US
dc.citation.epageen_US
dc.contributor.department光電學院zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentCollege of Photonicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000330431000123-
dc.citation.woscount1-
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