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dc.contributor.authorHung, Chih-Tsangen_US
dc.contributor.authorHuang, Shen-Cheen_US
dc.contributor.authorLu, Tien-Changen_US
dc.date.accessioned2014-12-08T15:35:18Z-
dc.date.available2014-12-08T15:35:18Z-
dc.date.issued2014-07-01en_US
dc.identifier.issn0030-3992en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.optlastec.2013.12.014en_US
dc.identifier.urihttp://hdl.handle.net/11536/23935-
dc.description.abstractWe investigate the effect of passivation structure on the optical mode distribution and characteristics of the edge emitting ridge waveguide AlGaInP-GaInP visible laser diodes (LDs). For conventional designs of single-layer Si3N4 or SiO2 passivation, the variation of lateral near-field confinement and the horizontal far-field (FF) divergence can be determined via the modification of dielectric layer thickness. Thin passivation layer suffers from high absorption at the metal interface while thick passivation layer suffers from poor heat dissipation in the ridge waveguide and high scattering loss, resulting in high threshold. We propose a novel design of three-pair Al2O3/Ta2O5 multilayer optical thin films as passivation on the ridge waveguide, which can improve the laser characteristics and the heat dissipation. The measured room-temperature threshold current (Ith) and characteristic temperature (T-0) are 44.5 mA and 104.2 K with a divergence angle of 16.4. (C) 2013 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectAlGaInPen_US
dc.subjectLaser diodesen_US
dc.subjectDielectric layeren_US
dc.titleEffect of passivation layers on characteristics of AlGaInP ridge waveguide laser diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.optlastec.2013.12.014en_US
dc.identifier.journalOPTICS AND LASER TECHNOLOGYen_US
dc.citation.volume59en_US
dc.citation.issueen_US
dc.citation.spage110en_US
dc.citation.epage115en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000331918200016-
dc.citation.woscount1-
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