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dc.contributor.authorTsai, Bi-Hueien_US
dc.date.accessioned2014-12-08T15:35:42Z-
dc.date.available2014-12-08T15:35:42Z-
dc.date.issued2010en_US
dc.identifier.isbn978-1-890843-22-9en_US
dc.identifier.urihttp://hdl.handle.net/11536/24106-
dc.description.abstractThe contribution of external intellectual property development by other firms to firms' internal innovation and productivity improvement is defined as "spillover effect". While some criticize that the intellectual property right protections on patents hinder the spillover effect, others propose that the compulsory patent disclosure or patent licensing enforces innovation spillovers. This paper thus provides the empirical evidence of patent and R&D spillover effect on productivity to resolve the controversy. The findings support that the spillover effect derived from other companies' innovative activities can enhance firm process or product innovation, thereby improving firm performance. Since technology learning from intra-industry R&D activities or patent development is swiftly facilitated for IC firms involved either in process innovation or in product innovation. R&D spillover effects in these firms appear evidently stronger. In contrast, because the IC firms rely more on patent licensing to develop core technology innovation, the patent spillover effect even is obvious as well.en_US
dc.language.isoen_USen_US
dc.titleInnovation Spillover Effect in Semiconductor Industryen_US
dc.typeProceedings Paperen_US
dc.identifier.journalPICMET 2010: TECHNOLOGY MANAGEMENT FOR GLOBAL ECONOMIC GROWTHen_US
dc.contributor.department管理科學系zh_TW
dc.contributor.departmentDepartment of Management Scienceen_US
dc.identifier.wosnumberWOS:000287527800272-
Appears in Collections:Conferences Paper