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dc.contributor.authorLai, Ying-Yuen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorHo, Tsung-Linen_US
dc.contributor.authorHuang, Shen-Cheen_US
dc.contributor.authorWang, Shing-Chungen_US
dc.date.accessioned2014-12-08T15:36:00Z-
dc.date.available2014-12-08T15:36:00Z-
dc.date.issued2014en_US
dc.identifier.isbn978-0-8194-9914-1en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/24360-
dc.identifier.urihttp://dx.doi.org/10.1117/12.2038448en_US
dc.description.abstractWe report on the numerical analysis of the electrical and optical properties of current-injected III-N based vertical-cavity surface-emitting lasers (VCSELs) with three types of current confinement schemes: the conventional planar-Indium Tin Oxide (ITO) type, the AlN-buried type without ITO, and the hybrid type. The proposed hybrid structure, which combines an ITO layer and an intracavity AlN aperture, exhibits not only a uniform current distribution but also an enhanced lateral optical confinement. Thus, the hybrid type design shows a remarkably better performance including lower threshold current and series resistance compared with the planar-ITO type and the AlN-buried type. Furthermore, the multi-transverse mode lasing behavior induced by strong index guiding of the AlN aperture is suppressed to single transverse mode operation by reducing the aperture size. Such design provides a powerful solution for the high performance III-N based VCSELs and is also viable by using current state of the art processing techniques.en_US
dc.language.isoen_USen_US
dc.subjectIII-nitrideen_US
dc.subjectVCSELsen_US
dc.subjectITOen_US
dc.subjectBuried AlN current aperturesen_US
dc.subjectcurrent crowdingen_US
dc.subjectlateral index guidingen_US
dc.titleNumerical Analysis on Current and Optical Confinement of III-Nitride Vertical-Cavity Surface-Emitting Lasersen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.2038448en_US
dc.identifier.journalVERTICAL-CAVITY SURFACE-EMITTING LASERS XVIIIen_US
dc.citation.volume9001en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000336033100016-
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