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dc.contributor.authorWu, Jau-Yangen_US
dc.contributor.authorLu, Ping-Kengen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.date.accessioned2014-12-08T15:36:18Z-
dc.date.available2014-12-08T15:36:18Z-
dc.date.issued2014-06-30en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://dx.doi.org/10.1364/OE.22.016462en_US
dc.identifier.urihttp://hdl.handle.net/11536/24632-
dc.description.abstractTwo-dimensional (2-D) photo-count mapping on CMOS single photon avalanche diodes (SPADs) has been demonstrated. Together with the varied incident wavelengths, the depth-dependent electric field distribution in active region has been investigated on two SPADs with different structures. Clear but different non-uniformity of photo-response have been observed for the two studied devices. With the help of simulation tool, the non-uniform photo-counts arising from the electric field non-uniformity have been well explained. As the quasi-3D distribution of electric field in the active region can be mapped, our method is useful for engineering the device structure to improve the photo-response of SPADs. (C) 2014 Optical Society of Americaen_US
dc.language.isoen_USen_US
dc.titleTwo-dimensional photo-mapping on CMOS single-photon avalanche diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1364/OE.22.016462en_US
dc.identifier.journalOPTICS EXPRESSen_US
dc.citation.volume22en_US
dc.citation.issue13en_US
dc.citation.spage16462en_US
dc.citation.epage16471en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000338055900123-
dc.citation.woscount0-
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