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dc.contributor.authorChen, En-Chenen_US
dc.contributor.authorTsai, Pei-Tingen_US
dc.contributor.authorChang, Bo-Jieen_US
dc.contributor.authorWang, Chun-Mingen_US
dc.contributor.authorMeng, Hsin-Feien_US
dc.contributor.authorTsai, Jia-Yingen_US
dc.contributor.authorChang, Yu-Fanen_US
dc.contributor.authorChen, Zhi-Kuanen_US
dc.contributor.authorLi, Chang-Hungen_US
dc.contributor.authorHsu, Yung-Hsuanen_US
dc.contributor.authorChen, Chun-Yuen_US
dc.contributor.authorLin, Hao-Wuen_US
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorHorng, Sheng-Fuen_US
dc.date.accessioned2014-12-08T15:36:19Z-
dc.date.available2014-12-08T15:36:19Z-
dc.date.issued2014-06-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.7567/JJAP.53.062301en_US
dc.identifier.urihttp://hdl.handle.net/11536/24663-
dc.description.abstractA bulk heterojunction organic solar cell with poly(3-hexylthiophene) (P3HT) as the donor and (6,6)-phenyl-C61-butyric acid methyl ester (PCBM) as the acceptor is deposited using blade coating on a hot plate at 80 degrees C with hot air of 70 degrees C applied from above. In contrast to the 30 min of conventional dichlorobenzene solvent annealing, the rapid-drying blade coating forms a dry film in 1 s. The fabrication throughput is substantially enhanced. The blade-coated film has a smoother surface roughness of 3.5nm compared with 10.5nm for solvent annealing; however, the desired phase separation in the 50nm scale forms despite the rapid drying. A single layer solar cell exhibits power conversion efficiency of 4.1% with blade coating in chlorobenzene, which is the same as solvent annealing device. A multilayer device with carrier blocking layers fabricated entirely of the less toxic toluene also exhibits efficiency of 4.1%. (C) 2014 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleMultilayer rapid-drying blade coating for organic solar cells by low boiling point solventsen_US
dc.typeArticleen_US
dc.identifier.doi10.7567/JJAP.53.062301en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume53en_US
dc.citation.issue6en_US
dc.citation.epageen_US
dc.contributor.department物理研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000338104600019-
dc.citation.woscount1-
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