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dc.contributor.authorSHIN, NFen_US
dc.contributor.authorHONG, JWen_US
dc.contributor.authorWU, YFen_US
dc.contributor.authorJEN, TSen_US
dc.contributor.authorCHANG, CYen_US
dc.date.accessioned2014-12-08T15:03:57Z-
dc.date.available2014-12-08T15:03:57Z-
dc.date.issued1994-06-01en_US
dc.identifier.issn1350-2433en_US
dc.identifier.urihttp://dx.doi.org/10.1049/ip-opt:19949800en_US
dc.identifier.urihttp://hdl.handle.net/11536/2471-
dc.description.abstractA narrow-bandwidth hydrogenated amorphous silicon (a-Si : H) photodetector with a basic structure of Al/n+-i-p+-i-n-i-p-i-n+/ITO/glass has been investigated. The spectral response of this new photodetector was found to be affected by the absorption coefficient of a-Si:H material, surface recombination current, device layer thicknesses, and applied bias. The spectral response of this device reveals a measured minimum FWHM of 58 nm at zero volt bias. The peak wavelength in the visible spectrum can be shifted from 400 nm (purple) to 550 nm (green) by decreasing the bias voltage from 5 to 0 V. The optoelectronic characteristics of this photodetector fit theoretically using suitable quantitative estimates.en_US
dc.language.isoen_USen_US
dc.subjectAMORPHOUS SILICONen_US
dc.subjectPHOTODETECTORSen_US
dc.titleINVESTIGATION OF NEW NARROW-BANDWIDTH A-SI-H PHOTODETECTORen_US
dc.typeArticleen_US
dc.identifier.doi10.1049/ip-opt:19949800en_US
dc.identifier.journalIEE PROCEEDINGS-OPTOELECTRONICSen_US
dc.citation.volume141en_US
dc.citation.issue3en_US
dc.citation.spage150en_US
dc.citation.epage156en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1994NZ55900002-
dc.citation.woscount0-
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