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dc.contributor.authorDeng, Ming-Jayen_US
dc.contributor.authorWang, Cheng-Chiaen_US
dc.contributor.authorHo, Pei-Jungen_US
dc.contributor.authorLin, Chih-Mingen_US
dc.contributor.authorChen, Jin-Mingen_US
dc.contributor.authorLu, Kueih-Tzuen_US
dc.date.accessioned2014-12-08T15:36:41Z-
dc.date.available2014-12-08T15:36:41Z-
dc.date.issued2014-08-28en_US
dc.identifier.issn2050-7488en_US
dc.identifier.urihttp://dx.doi.org/10.1039/c4ta02444cen_US
dc.identifier.urihttp://hdl.handle.net/11536/25048-
dc.description.abstractWith a simple electrochemical process, we prepared nano-architectured CuO electrodes with a 3D hierarchically porous structure and an excellent supercapacitive performance. These nano-architectured CuO electrodes were processed through co-deposition of a Ni-Cu layer on Ni foam, selective etching of Cu from the Ni-Cu film (leaving tentacle-like nanoporous Ni), and anodic deposition of CuO nanoribbons (NRs) on the tentacle-like nanoporous Ni/Ni foam substrate. Because of its unique nano-architecture, the prepared CuO nanoribbon-on-Ni-nanoporous/Ni foam (CNRNP) electrode shows exceptional performance of energy storage relative to a conventional version of the electrode. The CNRNP electrode has also a superior kinetic performance relative to CuO nanoflake-on-Ni foam (CNFNF) and flake-like CuO (FLC) electrodes. Besides its excellent cyclic stability, an exceptionally large specific capacitance of 880 and 800 F g(-1) (deducting the substrate capacitance from the total) for the CNRNP electrode is obtained at scan rates of 10 and 200 mV s(-1), respectively. The excellent pseudocapacitive characteristics of CNRNP electrodes associated with the variation of the Cu oxidation state during charge and discharge cycles were elucidated with in situ X-ray absorption near-edge structure (XANES) spectra.en_US
dc.language.isoen_USen_US
dc.titleFacile electrochemical synthesis of 3D nano-architectured CuO electrodes for high-performance supercapacitorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1039/c4ta02444cen_US
dc.identifier.journalJOURNAL OF MATERIALS CHEMISTRY Aen_US
dc.citation.volume2en_US
dc.citation.issue32en_US
dc.citation.spage12857en_US
dc.citation.epage12865en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000340347700030-
dc.citation.woscount4-
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