Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chou, Po-Chien | en_US |
dc.contributor.author | Cheng, Stone | en_US |
dc.contributor.author | Chen, Szu-Hao | en_US |
dc.date.accessioned | 2014-12-08T15:36:48Z | - |
dc.date.available | 2014-12-08T15:36:48Z | - |
dc.date.issued | 2014-09-05 | en_US |
dc.identifier.issn | 1359-4311 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1015/j.applthermaleng.2014.05.081 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/25182 | - |
dc.description.abstract | This work presents an extensive thermal characterization of a single discrete GaN high-electron-mobility transistor (HEMT) device when operated in parallel at temperatures of 25 degrees C-175 degrees C. The maximum drain current (I-D (max)), on-resistance (R-ON), pinch-off voltage (V-p) and peak transconductance (g(m)) at various chamber temperatures are measured and correlations among these parameters studied. Understanding the dependence of key transistor parameters on temperature is crucial to inhibiting the generation of hot spots and the equalization of currents in the parallel operation of HEMTs. A detailed analysis of the current imbalance between two parallel HEMT cells and its consequential effect on the junction temperature are also presented. The results from variations in the characteristics of the parallel-connected devices further verify that the thermal stability and switching behavior of these cells are balanced. Two parallel HEMT cells are operated at a safe working distance from thermal runaway to prevent destruction of the hottest cell. (C) 2014 Elsevier Ltd. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | GaN HEMTs | en_US |
dc.subject | Power semiconductor devices | en_US |
dc.subject | Power module | en_US |
dc.subject | Parallel operation | en_US |
dc.subject | Static parameters | en_US |
dc.title | Evaluation of thermal performance of all-GaN power module in parallel operation | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1015/j.applthermaleng.2014.05.081 | en_US |
dc.identifier.journal | APPLIED THERMAL ENGINEERING | en_US |
dc.citation.volume | 70 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 593 | en_US |
dc.citation.epage | 599 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 機械工程學系 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Department of Mechanical Engineering | en_US |
dc.identifier.wosnumber | WOS:000341464400063 | - |
dc.citation.woscount | 0 | - |
Appears in Collections: | Articles |
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