Chemoselective deprotection of acid labile primary hydroxyl protecting groups under CBr4-photoirradiation conditions

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DC 欄位	值	語言
dc.contributor.author	Chen, MY	en_US
dc.contributor.author	Patkar, LN	en_US
dc.contributor.author	Lu, KC	en_US
dc.contributor.author	Lee, ASY	en_US
dc.contributor.author	Lin, CC	en_US
dc.date.accessioned	2014-12-08T15:37:11Z	-
dc.date.available	2014-12-08T15:37:11Z	-
dc.date.issued	2004-12-06	en_US
dc.identifier.issn	0040-4020	en_US
dc.identifier.uri	http://dx.doi.org/10.1016/j.tet.2004.09.095	en_US
dc.identifier.uri	http://hdl.handle.net/11536/25557	-
dc.description.abstract	The CBr4-photoirradiation in methanol generates a controlled source of HBr, which can chemoselectively deprotect commonly used hydroxyl-protecting groups in saccharides and nucleosides, such as tert-butyldimethylsilyl, isopropylidene, benzylidene and triphenyl ethers in the presence of other acid-labile functional groups. (C) 2004 Elsevier Ltd. All rights reserved.	en_US
dc.language.iso	en_US	en_US
dc.subject	CBr4-photoirradiation	en_US
dc.subject	deprotection	en_US
dc.title	Chemoselective deprotection of acid labile primary hydroxyl protecting groups under CBr4-photoirradiation conditions	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1016/j.tet.2004.09.095	en_US
dc.identifier.journal	TETRAHEDRON	en_US
dc.citation.volume	60	en_US
dc.citation.issue	50	en_US
dc.citation.spage	11465	en_US
dc.citation.epage	11475	en_US
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:000225148000016	-
dc.citation.woscount	12	-
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