Improving spin-coating process using altered cover design

Title:	Improving spin-coating process using altered cover design
Authors:	Cheng, CM Chen, RH 機械工程學系 Department of Mechanical Engineering
Keywords:	thick-film photoresist;spin coating;work chamber cover
Issue Date:	1-Dec-2004
Abstract:	A novel work chamber cover design for a spin coater that can reduce the effect of airflow on spin coating is presented. The experimental results reveal that superior uniformity and film area can be obtained by utilizing the modified design instead of the conventional design.
URI:	http://dx.doi.org/10.1143/JJAP.43.8028 http://hdl.handle.net/11536/25577
ISSN:	0021-4922
DOI:	10.1143/JJAP.43.8028
Journal:	JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume:	43
Issue:	12
Begin Page:	8028
End Page:	8029
Appears in Collections:	Articles

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