| 標題: | RHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3 |
| 作者: | Wang, TC Lee, JY Hsieh, CC Juang, JY Wu, KH Uen, TM Gou, YS 電子物理學系 Department of Electrophysics |
| 公開日期: | 1-十二月-2004 |
| 摘要: | A series of investigations on the interrupted deposition of laser ablation strontium titanate epitaxy growth were conducted. RHEED intensity recovery curves at various temperatures show a near-quadratic power law dependence on annealing time. Combined with the evidence showing the intimate correlation between the step edge density and the RHEED intensity, a diffusion Arrhenius plot with the activation energy of 1.0 eV was obtained for the kinetics of step edge migration. |
| URI: | http://hdl.handle.net/11536/25585 |
| ISSN: | 0577-9073 |
| 期刊: | CHINESE JOURNAL OF PHYSICS |
| Volume: | 42 |
| Issue: | 6 |
| 起始頁: | 710 |
| 結束頁: | 716 |
| 顯示於類別: | 期刊論文 |

