RHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3

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DC 欄位	值	語言
dc.contributor.author	Wang, TC	en_US
dc.contributor.author	Lee, JY	en_US
dc.contributor.author	Hsieh, CC	en_US
dc.contributor.author	Juang, JY	en_US
dc.contributor.author	Wu, KH	en_US
dc.contributor.author	Uen, TM	en_US
dc.contributor.author	Gou, YS	en_US
dc.date.accessioned	2014-12-08T15:37:14Z	-
dc.date.available	2014-12-08T15:37:14Z	-
dc.date.issued	2004-12-01	en_US
dc.identifier.issn	0577-9073	en_US
dc.identifier.uri	http://hdl.handle.net/11536/25585	-
dc.description.abstract	A series of investigations on the interrupted deposition of laser ablation strontium titanate epitaxy growth were conducted. RHEED intensity recovery curves at various temperatures show a near-quadratic power law dependence on annealing time. Combined with the evidence showing the intimate correlation between the step edge density and the RHEED intensity, a diffusion Arrhenius plot with the activation energy of 1.0 eV was obtained for the kinetics of step edge migration.	en_US
dc.language.iso	en_US	en_US
dc.title	RHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3	en_US
dc.type	Article	en_US
dc.identifier.journal	CHINESE JOURNAL OF PHYSICS	en_US
dc.citation.volume	42	en_US
dc.citation.issue	6	en_US
dc.citation.spage	710	en_US
dc.citation.epage	716	en_US
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	Department of Electrophysics	en_US
dc.identifier.wosnumber	WOS:000225781900005	-
dc.citation.woscount	0	-
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