標題: RHEED in-situ monitored step edge diffusion during interrupted laser ablation epitaxy growth of SrTiO3
作者: Wang, TC
Lee, JY
Hsieh, CC
Juang, JY
Wu, KH
Uen, TM
Gou, YS
電子物理學系
Department of Electrophysics
公開日期: 1-十二月-2004
摘要: A series of investigations on the interrupted deposition of laser ablation strontium titanate epitaxy growth were conducted. RHEED intensity recovery curves at various temperatures show a near-quadratic power law dependence on annealing time. Combined with the evidence showing the intimate correlation between the step edge density and the RHEED intensity, a diffusion Arrhenius plot with the activation energy of 1.0 eV was obtained for the kinetics of step edge migration.
URI: http://hdl.handle.net/11536/25585
ISSN: 0577-9073
期刊: CHINESE JOURNAL OF PHYSICS
Volume: 42
Issue: 6
起始頁: 710
結束頁: 716
顯示於類別:期刊論文


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