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dc.contributor.authorWang, JSen_US
dc.contributor.authorHsiao, RSen_US
dc.contributor.authorLin, Gen_US
dc.contributor.authorLin, KFen_US
dc.contributor.authorLiu, HYen_US
dc.contributor.authorLai, CMen_US
dc.contributor.authorWei, Len_US
dc.contributor.authorLiang, CYen_US
dc.contributor.authorChi, JYen_US
dc.contributor.authorKovsh, ARen_US
dc.contributor.authorMaleev, NAen_US
dc.contributor.authorLivshits, DAen_US
dc.contributor.authorChen, JFen_US
dc.contributor.authorYu, HCen_US
dc.contributor.authorUstinov, VMen_US
dc.date.accessioned2014-12-08T15:37:23Z-
dc.date.available2014-12-08T15:37:23Z-
dc.date.issued2004-11-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.1807839en_US
dc.identifier.urihttp://hdl.handle.net/11536/25703-
dc.description.abstractMolecular-beam-epitaxy growth of high structural and optical-quality InGaAsN/GaAs quantum wells (QW) has been investigated. The material quality can be improved significantly by using low-temperature growth to suppress the phase separation. High-performance ridge-waveguide InGaAsN/GaAs single QW lasers emitting at 1.3 mum have been demonstrated. Infinite-cavity-length threshold-current density of 400 A /cm(2), internal quantum efficiency of 96%. and a slope efficiency of 0.67 W/A for a cavity length L=1 mm were obtained. A TO46 packaging laser shows sin-le lateral-mode kink-free output power of more than 200 mW with a maximum total wallplug efficiency of 29% at room temperature under continuous wave (cw) operation. Moreover. 1.3 Am InGaAsN/GaAs QW vertical-cavity surface-emitting lasers with a threshold current density lower than 2 KA/cm(2) at room temperature have been achieved. We obtained multimode cw output power and slope efficiency in excess of 1 mW and 0.15 W/A. respectively. (C) 2004 American Vacuum Society.en_US
dc.language.isoen_USen_US
dc.titleMolecular-beam-epitaxy growth of high-quality InGaAsN/GaAs quantum well lasers emitting at 1.3 mu men_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.1807839en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume22en_US
dc.citation.issue6en_US
dc.citation.spage2663en_US
dc.citation.epage2667en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000226439800021-
dc.citation.woscount9-
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