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dc.contributor.authorLi, Yimingen_US
dc.contributor.authorTseng, Yu-Hsiangen_US
dc.date.accessioned2014-12-08T15:37:49Z-
dc.date.available2014-12-08T15:37:49Z-
dc.date.issued2011en_US
dc.identifier.issn1042-6914en_US
dc.identifier.urihttp://hdl.handle.net/11536/26010-
dc.identifier.urihttp://dx.doi.org/10.1080/10426914.2010.526977en_US
dc.description.abstractA set of semiconductor device model and parameters bridges the communities between circuit design and chip fabrication. In this article, we present an intelligent extraction technique for obtaining a set of optimal model parameters of the surface-potential-based PSP model for the sub-45-nm metal-oxide-semiconductor field effect transistors (MOSFETs). The proposed algorithm combines the standard velocity and position update rules in a particle swarm optimization (PSO) algorithm, and the operations of differential mutation and probability crossover from a differential evolution method. This differential approach can increase the diversity of the population and help particles escape from the local optimal solutions. In addition, the adopted fitness function considers not only the error of the I-V curves, but also their first derivatives. Compared with conventional engineering extraction strategy, the hybrid method extracts 14 DC parameters simultaneously for sub-45-nm N-MOSFET devices. The best accuracy and interesting computational efficiency are obtained by several testing cases.en_US
dc.language.isoen_USen_US
dc.subjectDifferential evolutionen_US
dc.subjectHybrid methoden_US
dc.subjectMOSFETen_US
dc.subjectParameter extractionen_US
dc.subjectParticle swarm optimizationen_US
dc.subjectPSPen_US
dc.titleHybrid Differential Evolution and Particle Swarm Optimization Approach to Surface-Potential-Based Model Parameter Extraction for Nanoscale MOSFETsen_US
dc.typeArticleen_US
dc.identifier.doi10.1080/10426914.2010.526977en_US
dc.identifier.journalMATERIALS AND MANUFACTURING PROCESSESen_US
dc.citation.volume26en_US
dc.citation.issue3en_US
dc.citation.spage388en_US
dc.citation.epage397en_US
dc.contributor.department傳播研究所zh_TW
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentInstitute of Communication Studiesen_US
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000289582400007-
dc.citation.woscount8-
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