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dc.contributor.authorLo, Tien-Yuen_US
dc.contributor.authorHung, Chung-Chihen_US
dc.contributor.authorLo, Chi-Hsiangen_US
dc.date.accessioned2014-12-08T15:37:51Z-
dc.date.available2014-12-08T15:37:51Z-
dc.date.issued2011-01-01en_US
dc.identifier.issn0925-1030en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s10470-010-9520-6en_US
dc.identifier.urihttp://hdl.handle.net/11536/26034-
dc.description.abstractThis paper presents a high linearity MOSFET-only transconductor based on differential structures. While a precise BSIM4 transistor model is introduced through analysis, the linearity can be improved by mobility compensation techniques as the device size is scaled down in the nano-scale CMOS technology. When the compensation utilizes transistors in subthreshold region, rather than the transistors in saturation region, the value of transconductance can be maintained. The circuit is fabricated in TSMC 0.18-mu m CMOS process. The measurement results show 18 dB improvement of the proposed version, and 65 dB HD3 can be achieved for a 2.1 MHz 700 mV(pp) differential input. The static power consumption under 1-V power supply voltage is 183 mu W. Measurement results demonstrate the agreement with theoretical analyses.en_US
dc.language.isoen_USen_US
dc.subjectTransconductoren_US
dc.subjectSubthresholden_US
dc.subjectTHDen_US
dc.titleLinear low voltage nano-scale CMOS transconductoren_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s10470-010-9520-6en_US
dc.identifier.journalANALOG INTEGRATED CIRCUITS AND SIGNAL PROCESSINGen_US
dc.citation.volume66en_US
dc.citation.issue1en_US
dc.citation.spage1en_US
dc.citation.epage7en_US
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000286933900001-
dc.citation.woscount4-
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