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dc.contributor.authorChung, Wan-Fangen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLi, Hung-Weien_US
dc.contributor.authorChen, Chi-Wenen_US
dc.contributor.authorChen, Yu-Chunen_US
dc.contributor.authorChen, Shih-Chingen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.date.accessioned2014-12-08T15:38:00Z-
dc.date.available2014-12-08T15:38:00Z-
dc.date.issued2011-01-01en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3526097en_US
dc.identifier.urihttp://hdl.handle.net/11536/26086-
dc.description.abstractThe original influence of water on the back-channel of sol-gel derived amorphous indium-gallium-zinc-oxide thin film transistors was studied in various relative humidity environments. As humidity increased from 0 to 80%, the mobility increased from 0.22 to 0.24 cm(2)/(V s), threshold voltage decreased from 6.6 to 4.4 V, and subthreshold swing changed from 0.77 to 1.27 V/dec. The conflicting phenomenon among the three parameters was suggested to be due to a division of the gate voltage by the water molecules which adsorbed on the thin film transistor back-channel and acted as dipoles. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3526097] All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleInfluence of H(2)O Dipole on Subthreshold Swing of Amorphous Indium-Gallium-Zinc-Oxide Thin Film Transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3526097en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume14en_US
dc.citation.issue3en_US
dc.citation.spageH114en_US
dc.citation.epageH116en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
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