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dc.contributor.authorLin, T. C.en_US
dc.contributor.authorWu, Y. H.en_US
dc.contributor.authorLi, L. C.en_US
dc.contributor.authorSung, Y. T.en_US
dc.contributor.authorLin, S. D.en_US
dc.contributor.authorChang, L.en_US
dc.contributor.authorSuen, Y. W.en_US
dc.contributor.authorLee, C. P.en_US
dc.date.accessioned2014-12-08T15:38:16Z-
dc.date.available2014-12-08T15:38:16Z-
dc.date.issued2010-12-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3520669en_US
dc.identifier.urihttp://hdl.handle.net/11536/26219-
dc.description.abstractThe magneto-optical response of type-II tensily strained GaAs self-assembled quantum dots in GaSb was investigated in magnetic fields up to 14 T. By depositing different GaAs amount, the dot sizes and the corresponding emission energies were varied. We analyzed the carrier wave function extent of different dots using the diamagnetic shift results. It was found that, with the increase in the energy (the reduction in the dot size), the diamagnetic coefficient first rises quickly and then saturates at around 21 mu eV/T(2). Based on a simple calculation model, this unusual tendency is attributed to the electrons gradually spilling out of the quantum dot to the wetting layer as the dots get smaller. This delocalization effect is enhanced in this material system due to the tensile strain relaxation within the dots, which raises the conduction band edge over that in the wetting layer. (c) 2010 American Institute of Physics. [doi: 10.1063/1.3520669]en_US
dc.language.isoen_USen_US
dc.titleElectron delocalization of tensily strained GaAs quantum dots in GaSb matrixen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3520669en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume108en_US
dc.citation.issue12en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department奈米科技中心zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentCenter for Nanoscience and Technologyen_US
dc.identifier.wosnumberWOS:000285768800023-
dc.citation.woscount3-
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