標題: Effect of grain curvature on nano-indentation measurements of thin films
作者: Tsai, KY
Chin, TS
Shieh, HPD
光電工程學系
Department of Photonics
關鍵字: nano-indentation;hardness of thin film;Young's modulus of thin film;VO2;vanadium dioxide;grain curvature effect
公開日期: 1-Sep-2004
摘要: Grain curvature effect on the measurement of nano-indentation has been observed for the first time, taking VO2 thin film as an example. As the grain size of thin film is comparable to the diameter of indenter tip, the maximum penetration depths under the same maximum load (P-max) vary and lead to deviations in estimated hardness and Young's modulus. Under the same Pmax, larger penetration depth leads to a larger projected area, and a decrease in hardness. The large deviation of stiffness, affected by surface roughness under low Pmax, produces fluctuation of Young's modulus. Increase in penetration depth diminishes the roughness effect so that deviations in penetration depths dominate the variations in Young's modulus. The hardness and Young's modulus curves measured at lowest penetration depth, being thought to be free from effect of grain curvature, coincide very well to the curves measured by continuous stiffness measurements mode.
URI: http://dx.doi.org/10.1143/JJAP.43.6268
http://hdl.handle.net/11536/26395
ISSN: 0021-4922
DOI: 10.1143/JJAP.43.6268
期刊: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume: 43
Issue: 9A
起始頁: 6268
結束頁: 6273
Appears in Collections:Articles


Files in This Item:

  1. 000224579000070.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.