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dc.contributor.authorBiswas, Den_US
dc.contributor.authorMeikap, AKen_US
dc.contributor.authorChattopadhyay, SKen_US
dc.contributor.authorChatterjee, SKen_US
dc.contributor.authorLin, JJen_US
dc.date.accessioned2014-12-08T15:38:42Z-
dc.date.available2014-12-08T15:38:42Z-
dc.date.issued2004-08-02en_US
dc.identifier.issn0375-9601en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.physleta.2004.06.016en_US
dc.identifier.urihttp://hdl.handle.net/11536/26485-
dc.description.abstractIn this Letter we report on the electrical resistivity and magneto-resistivity of disordered V80Al20-xFex alloys in the temperature range 1.5 less than or equal to T less than or equal to 300 K and analyze them in the light of weak localization and electron-electron interaction. The low temperature zero field resistivity obeys a T-1/2 law, which is explained by electron-electron interaction. The low field magneto-resistivity is described by weak localization theory under strong spin-orbit interaction. The electron-phonon scattering rate obeys a quadratic temperature dependence. This observation is interpreted by the existing theories of electron-phonon interaction. (C) 2004 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectvanadium alloyen_US
dc.subjectelectron-phonon scatteringen_US
dc.subjectmagneto-resistivityen_US
dc.subjectlow temperatureen_US
dc.titleWeak localization and electron-electron interaction in disordered V80Al20-xFex alloys at low temperatureen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.physleta.2004.06.016en_US
dc.identifier.journalPHYSICS LETTERS Aen_US
dc.citation.volume328en_US
dc.citation.issue4-5en_US
dc.citation.spage380en_US
dc.citation.epage386en_US
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000223004100019-
dc.citation.woscount3-
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