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dc.contributor.authorYeh, TTen_US
dc.contributor.authorHsieh, TEen_US
dc.contributor.authorShieh, HPDen_US
dc.date.accessioned2014-12-08T15:38:47Z-
dc.date.available2014-12-08T15:38:47Z-
dc.date.issued2004-08-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.43.5316en_US
dc.identifier.urihttp://hdl.handle.net/11536/26544-
dc.description.abstractThis work investigated the enhancement of the data transfer rate and/or recrystallization speed of Ge-In-Sb-Te recording material by nitrogen doping. The effects of nitrogen content on the dynamic properties of optical disks and the corresponding microstructural changes of the recording layer were studied. The experimental results showed that nitrogen doping at a sputtering gas flow ratio of N-2/Ar = 3% might enhance the data transfer rate of an optical disk up to 1.6 times without severely damaging the signal jitter values. However, the disks failed the dynamic tests when too much nitrogen (N-2/Ar greater than or equal to 5%) was introduced. Dynamic testing also revealed that nitrogen doping slightly increased the noise level and jitter of the disks. Transmission electron microscopy (TEM) found that nitrogen doping promoted a phase transformation by generating numerous nucleation sites uniformly distributed in the recording layer and hence increased recrystallization speed.en_US
dc.language.isoen_USen_US
dc.subjectGe-In-Sb-Te recording materialen_US
dc.subjectdata transfer rateen_US
dc.subjectrecrystallization speeden_US
dc.subjectnitrogen dopingen_US
dc.titleEnhancement of data transfer rate of phase change optica disk by doping nitrogen in Ge-In-Sb-Te recording layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.43.5316en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume43en_US
dc.citation.issue8Aen_US
dc.citation.spage5316en_US
dc.citation.epage5320en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000224841400044-
dc.citation.woscount7-
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