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dc.contributor.authorPan, TMen_US
dc.contributor.authorLei, TFen_US
dc.contributor.authorKo, FHen_US
dc.contributor.authorChao, TSen_US
dc.contributor.authorChin, THen_US
dc.contributor.authorLu, CPen_US
dc.date.accessioned2014-12-08T15:38:47Z-
dc.date.available2014-12-08T15:38:47Z-
dc.date.issued2004-08-01en_US
dc.identifier.issn0894-6507en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TSM.2004.831944en_US
dc.identifier.urihttp://hdl.handle.net/11536/26551-
dc.description.abstractWe have developed a number of novel solutions to use for one-step pregate oxide cleaning; they are based on tetraalkylammonium hydroxides of varying alkyl chain lengths, namely tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide (TPAH), and tetrabutylammonium hydroxide (TBAH). We added these surfactants together with ethylenediaminetetraacetic acid (EDTA) into the RCA SC-1 cleaning solution to enhance the efficiency of cleaning. With the exception of the TBAH solution, the cleaning efficiency of these solutions toward particles was 4%-7% higher than that of the conventional RCA method. Our cleaning methods have better efficiency toward the removal of Fe, Na, Ca, Cu, and Mn contaminants. We found that the conventional RCA method results in 10(9)-10(10) atoms/cm(2) of Cu and Mn after cleaning. The electrical breakdown field of MOS capacitors was enhanced when using the new cleaning method. The literature model for surface adsorption and double-layer formation explains the cleaning behavior of the tetraalkylammonium ion-containing solutions. The removal of surface particles and metallic contaminants and the degree of surface roughness agree with the model's predictions. We believe that the best solution for use in one-step cleaning-one that comprises EDTA and TPAH-can replace the traditional RCA cleaning method. This new method has great potential for pregate oxide cleaning because it has the advantages of faster cycle times, lower costs, and greater efficiency.en_US
dc.language.isoen_USen_US
dc.subjectcleaningen_US
dc.subjectethylenediaminetetraacetic acid (EDTA)en_US
dc.subjectpregate oxideen_US
dc.subjectRCA methoden_US
dc.subjecttetrapropylammonium hydroxide (TPAH)en_US
dc.titleNovel one-step aqueous solutions to replace pregate oxide cleansen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TSM.2004.831944en_US
dc.identifier.journalIEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURINGen_US
dc.citation.volume17en_US
dc.citation.issue3en_US
dc.citation.spage470en_US
dc.citation.epage476en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000223187900029-
dc.citation.woscount3-
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