Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chang, EY | en_US |
dc.contributor.author | Lin, YC | en_US |
dc.contributor.author | Chen, GJ | en_US |
dc.contributor.author | Lee, HM | en_US |
dc.contributor.author | Huang, GW | en_US |
dc.contributor.author | Biswas, D | en_US |
dc.contributor.author | Chang, CY | en_US |
dc.date.accessioned | 2014-12-08T15:38:55Z | - |
dc.date.available | 2014-12-08T15:38:55Z | - |
dc.date.issued | 2004-07-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.43.L871 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/26651 | - |
dc.description.abstract | A metamorphic high-electron-mobility transistor (MHEMT) with In0.55Ga0.45As/In0.67Ga0.33As/In0.55Ga0.45As composite channel layers was developed for low-noise and high-linearity applications. The use of: a composite channel results in high electron mobility and good confinement of electrons in the channel region which are the desired characteristics of low-noise and high-linearity devices. The noise figure of the 0.25 x 160 mum(2) devices is 0.23 dB with 15.06 dB associated gain, and the output third-order intercept point (IP3) is 18.67 dBm at 6 GHz. The device shows great potential for high-linearity and low-noise applications at high frequencies. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | MHEMT | en_US |
dc.subject | composite channel | en_US |
dc.subject | high linearity | en_US |
dc.subject | low noise | en_US |
dc.subject | IP3 | en_US |
dc.title | Composite-channel metamorphic high electron mobility transistor for low-noise and high-linearity applications | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1143/JJAP.43.L871 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | en_US |
dc.citation.volume | 43 | en_US |
dc.citation.issue | 7A | en_US |
dc.citation.spage | L871 | en_US |
dc.citation.epage | L872 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | 友訊交大聯合研發中心 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.contributor.department | D Link NCTU Joint Res Ctr | en_US |
dc.identifier.wosnumber | WOS:000222615500014 | - |
dc.citation.woscount | 1 | - |
Appears in Collections: | Articles |
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