The Impact of Uniaxial Strain on Low Frequency Noise of Nanoscale PMOSFETs with e-SiGe and i-SiGe Source/Drain

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Yeh, Kuo-Liang	en_US
dc.contributor.author	Hong, Wei-Lun	en_US
dc.contributor.author	Guo, Jyh-Chyurn	en_US
dc.date.accessioned	2014-12-08T15:39:00Z	-
dc.date.available	2014-12-08T15:39:00Z	-
dc.date.issued	2010	en_US
dc.identifier.isbn	978-1-4244-6057-1	en_US
dc.identifier.issn	0149-645X	en_US
dc.identifier.uri	http://hdl.handle.net/11536/26698	-
dc.language.iso	en_US	en_US
dc.title	The Impact of Uniaxial Strain on Low Frequency Noise of Nanoscale PMOSFETs with e-SiGe and i-SiGe Source/Drain	en_US
dc.type	Meeting Abstract	en_US
dc.identifier.journal	2010 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST (MTT)	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.identifier.wosnumber	WOS:000288196502125	-
顯示於類別：	會議論文