Title: The removal of airborne molecular contamination in cleanroom using PTFE and chemical filters
Authors: Yeh, CF
Hsiao, CW
Lin, SJ
Hsieh, CM
Kusumi, T
Aomi, H
Kaneko, H
Dai, BT
Tsai, MS
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
Keywords: airborne molecular contamination;chemical filter;glass fiber filter;PTFE filter
Issue Date: 1-May-2004
Abstract: Cleanroom contamination and its impact on the performance of devices are beginning to be investigated due to the increasing sensitivity of the semiconductor manufacturing process to airborne molecular contamination (AMC). A clean bench was equipped with different filter modules and then most AMC in the cleanroom and in the clean bench was detected through air-sampling and wafer-sampling experiments. Additionally, the effect of AMC on device performance was examined by electrical characterization. A combination of the NEUROFINE PTFE filter and chemical filters was found to control metal, organic, and inorganic contamination. We believe that the new combination of filters can be used to improve the manufacturing environment of devices, which are being continuously shrunk to the nanometer scale.
URI: http://dx.doi.org/10.1109/TSM.2004.826957
http://hdl.handle.net/11536/26829
ISSN: 0894-6507
DOI: 10.1109/TSM.2004.826957
Journal: IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
Volume: 17
Issue: 2
Begin Page: 214
End Page: 220
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