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dc.contributor.authorTu, RCen_US
dc.contributor.authorTun, CJen_US
dc.contributor.authorChuo, CCen_US
dc.contributor.authorLee, BCen_US
dc.contributor.authorTsai, CEen_US
dc.contributor.authorWang, TCen_US
dc.contributor.authorChi, Jen_US
dc.contributor.authorLee, CPen_US
dc.contributor.authorChi, GCen_US
dc.date.accessioned2014-12-08T15:39:36Z-
dc.date.available2014-12-08T15:39:36Z-
dc.date.issued2004-02-15en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.43.L264en_US
dc.identifier.urihttp://hdl.handle.net/11536/27029-
dc.description.abstractThis study examined how the duration of SiNx treatment on an underlying GaN layer affects the optical property, surface morphology and density of following InGaN quantum dots (QDs). InGaN QDs with extremely high density of near 3 x 10(11) cm(-2) exhibited strong photoluminescence (PL) emission at room temperature (RT). Increasing the duration of the SiN, treatment of the underlying GaN layer, the RT-PL peak of the following InGaN nano-islands and QDs was found to be red-shifted from the violet to the greenish region, and the spectrum was broadened. Additionally, the average height of InGaN nano-islands and QDs increased with the duration of SiNs treatment, explaining the redshift of the RT-PL peak.en_US
dc.language.isoen_USen_US
dc.subjectInGaNen_US
dc.subjectquantum doten_US
dc.subjectdensityen_US
dc.subjectSiNxen_US
dc.subjectphotoluminescenceen_US
dc.subjectatomic force microscopyen_US
dc.titleUltra-high-density InGaN quantum dots grown by metalorganic chemical vapor depositionen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.43.L264en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERSen_US
dc.citation.volume43en_US
dc.citation.issue2Ben_US
dc.citation.spageL264en_US
dc.citation.epageL266en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000220378600010-
dc.citation.woscount18-
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