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dc.contributor.authorWang, YKen_US
dc.contributor.authorHuang, CHen_US
dc.contributor.authorTseng, TYen_US
dc.contributor.authorLinb, Pen_US
dc.date.accessioned2014-12-08T15:39:52Z-
dc.date.available2014-12-08T15:39:52Z-
dc.date.issued2004en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/27243-
dc.identifier.urihttp://dx.doi.org/10.1149/1.1667522en_US
dc.description.abstractPb(Zr0.53Ti0.47)O-3 (PZT) thin films with a (110) preferred orientation were prepared on Ba0.5Sr0.5RuO3 (BSR)/Ru/SiO2/Si substrates using a sol-gel method. The oxide bottom electrode, BSR, was fabricated at various temperatures on Ru/SiO2/Si substrates by rf sputtering. The annealed PZT films on BSR/Ru/SiO2/Si substrates exhibited improved crystallinity. The electrical properties of PZT films, such as the electric field (E) induced variations of the leakage current density, the dielectric constant, and the polarization were strongly dependent on the processing temperatures of the PZT films as well as the bottom oxide electrode. A typical PZT thin film annealed at 650degreesC on the BSR electrode, which was deposited at 450degreesC on the Ru/SiO2/Si substrate by a sputtering technique, has a leakage current of 2.7 x 10(-7) A/cm(2) at an applied electric field of 500 kV/cm and a dielectric constant of 968. From the polarization-electric field characteristics, the remanent polarization and coercive field of the PZT were found to be 38.9 muC/cm(2) and 59.6 kV/cm, respectively, at an applied voltage of 5 V. The PZT films exhibited fatigue-free characteristics up to similar to1.0 x 10(12) switching cycles under 5 V bipolar pulses. (C) 2004 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleStudies on ferroelectric properties of sol-gel derived Pb(Zr0.53Ti0.47)O-3 using Ba0.5Sr0.5RuO3 as the conductive electrodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.1667522en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume151en_US
dc.citation.issue4en_US
dc.citation.spageF87en_US
dc.citation.epageF91en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000220560700048-
dc.citation.woscount3-
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