標題: | Temperature dependence of Fluorine-doped tin oxide films produced by ultrasonic spray pyrolysis |
作者: | Lin, Chin-Ching Chiang, Mei-Ching Chen, Yu-Wei 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Fluorine doping;Fluorine concentration;Tin oxide;Spray pyrolysis;SIMS |
公開日期: | 15-十二月-2009 |
摘要: | Fluorine-doped tin oxide (FTO) films were prepared at different substrate temperatures by ultrasonic spray pyrolysis technique on glass substrates. Among F-doped tin oxide films, the lowest resistivitiy was found to be 6.2 x 10(-4) Omega-cm for a doping percentage of 50 mol% of fluorine in 0.5 M solution, deposited at 400 degrees C. Hall coefficient analyses and secondary ion mass spectrometry (SIMS) measured the electron carrier concentration that varies from 3.52 x 10(20) cm(-3) to 6.21 x 10(20) cm(-3) with increasing fluorine content from 4.6 x 10(20) cm(-3) to 7.2 x 10(20) cm(-3) in FTO films deposited on various temperatures. Deposition temperature on FTO films has been optimized for achieving a minimum resistivity and maximum optical transmittance. (C) 2009 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.tsf.2009.05.064 http://hdl.handle.net/11536/27299 |
ISSN: | 0040-6090 |
DOI: | 10.1016/j.tsf.2009.05.064 |
期刊: | THIN SOLID FILMS |
Volume: | 518 |
Issue: | 4 |
起始頁: | 1241 |
結束頁: | 1244 |
顯示於類別: | 會議論文 |