標題: Temperature dependence of Fluorine-doped tin oxide films produced by ultrasonic spray pyrolysis
作者: Lin, Chin-Ching
Chiang, Mei-Ching
Chen, Yu-Wei
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Fluorine doping;Fluorine concentration;Tin oxide;Spray pyrolysis;SIMS
公開日期: 15-十二月-2009
摘要: Fluorine-doped tin oxide (FTO) films were prepared at different substrate temperatures by ultrasonic spray pyrolysis technique on glass substrates. Among F-doped tin oxide films, the lowest resistivitiy was found to be 6.2 x 10(-4) Omega-cm for a doping percentage of 50 mol% of fluorine in 0.5 M solution, deposited at 400 degrees C. Hall coefficient analyses and secondary ion mass spectrometry (SIMS) measured the electron carrier concentration that varies from 3.52 x 10(20) cm(-3) to 6.21 x 10(20) cm(-3) with increasing fluorine content from 4.6 x 10(20) cm(-3) to 7.2 x 10(20) cm(-3) in FTO films deposited on various temperatures. Deposition temperature on FTO films has been optimized for achieving a minimum resistivity and maximum optical transmittance. (C) 2009 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2009.05.064
http://hdl.handle.net/11536/27299
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2009.05.064
期刊: THIN SOLID FILMS
Volume: 518
Issue: 4
起始頁: 1241
結束頁: 1244
顯示於類別:會議論文


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