Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | WU, CC | en_US |
dc.date.accessioned | 2014-12-08T15:04:14Z | - |
dc.date.available | 2014-12-08T15:04:14Z | - |
dc.date.issued | 1994 | en_US |
dc.identifier.issn | 0749-6036 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/2734 | - |
dc.identifier.uri | http://dx.doi.org/10.1006/spmi.1994.1021 | en_US |
dc.description.abstract | Free-carrier absorption has been studied for quantum well structures fabricated from III-V semiconducting materials where the acoustic phonon scattering is important. The energy band of carriers is assumed to be nonparabolic. We discuss the effect of acoustic phonon scattering on the free-carrier absorption for both deformation-potential coupling and piezoelectric coupling. It is found that the free-carrier absorption coefficient depends upon the polarization of the electromagnetic radiation relative to the layer plane or quantum well, the photon frequency, and the temperature. When the deformation-potential coupling is dominant, the free-carrier absorption coefficient increases with increasing temperature for photons polarized in the layer plane or perpendicular to the layer plane. However, when the piezoelectric coupling is dominant, the free-carrier absorption coefficient increases with increasing temperature for photons polarized in the layer plane, but for photons polarized perpendicularly to the layer plane, the free-carrier absorption coefficient decreases with increasing temperature. Moreover, at high temperatures such as T = 300 K, the free-carrier absorption coefficient oscillates with the film thickness in a small quantum well region and then decreases monotonically with increasing the film thickness. This is different from the result for three-dimensional semiconducting solids. | en_US |
dc.language.iso | en_US | en_US |
dc.title | FREE-CARRIER ABSORPTION IN QUANTUM-WELL STRUCTURES FOR ACOUSTIC-PHONON SCATTERING | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1006/spmi.1994.1021 | en_US |
dc.identifier.journal | SUPERLATTICES AND MICROSTRUCTURES | en_US |
dc.citation.volume | 15 | en_US |
dc.citation.issue | 2 | en_US |
dc.citation.spage | 109 | en_US |
dc.citation.epage | 112 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 電控工程研究所 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
dc.identifier.wosnumber | WOS:A1994PX48100009 | - |
dc.citation.woscount | 2 | - |
Appears in Collections: | Articles |
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